Bottom discharge CVD vapor deposition furnace

Chemical Vapor Deposition (CVD) is a method by introducing precursor substances (usually organic compounds or metal organic compounds) in the reaction gas into the reaction chamber, and causing them to thermally decompose or chemically react at high temperatures to form The reaction product is deposited onto the substrate to form a thin film. This method can be used to prepare industrial furnaces for heating materials such as metals, alloys, semiconductors and ceramics. It is widely used in the following industries and product manufacturing: Civil aviation carbon brake disc Carbon-carbon thermal field materials for single crystal silicon growth furnace Carbon-carbon thermal field materials for polycrystalline silicon hydrogenation furnaces Carbon-carbon thermal field materials for polycrystalline silicon ingot furnaces and PECVD furnaces Carbon-carbon high temperature structural materials Carbon-carbon high temperature structural part…

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