High purity niobium target

What is a niobium sputtering target? Niobium sputtering target is a high-purity niobium metal raw material used for sputtering deposition coatings. According to the shape, niobium sputtering targets can be divided into round, rectangular, square, ring, elliptical, cylindrical, flat, and rotating niobium targets. Niobium sputtering targets have high ductility and harden with increasing impurity content. Niobium sputtering targets can be used in the nuclear industry.   Common applications of niobium sputtering targets The high-purity niobium sputtering targets we produce have excellent conductivity in the physical vapor deposition process and can obtain films with the smallest particles. It can be used in the nuclear industry, semiconductors, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.   List of Niobium Sputtering Target Sizes Product Name Shape Purity Dimensions (inches) Thickness (mm) Niobium Sputtering Target Rou…

Niobium Metal Zirconium Metal Molybdenum Alloy Pure Tungsten Pure Tantalum